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Journal Details

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Plasma Devices and Operations

Plasma Devices and Operations


Published By: Taylor & Francis
Volume Number: 16
Frequency: 4 issues per year
Print ISSN: 1051-9998
Online ISSN: 1029-4929
 

Aims & Scope

Plasma Devices and Operations includes the latest information on the following:

  • Plasma technology, engineering and applications
  • Plasma sources and pulsed plasma devices
  • Plasma accelerators
  • MHD devices
  • Plasma for lasers and laser induced plasma
  • Controlled fusion
  • Magnet systems for plasma confinement
  • Plasma heating systems
  • Lasers for fusion
  • Fuel cycle and vacuum technology for fusion
  • First wall and plasma facing components
  • Plasma diagnostics
  • Structural materials for fusion

It also focuses on engineering problems with experimental devices for fusion.

All published research articles in Plasma Devices and Operations have undergone rigorous peer review, based on initial editor screening and anonymized refereeing by expert referees.

Taylor & Francis makes every effort to ensure the accuracy of all the information (the "Content") contained in its publications. However, Taylor & Francis and its agents and licensors make no representations or warranties whatsoever as to the accuracy, completeness or suitability for any purpose of the Content and disclaim all such representations and warranties whether express or implied to the maximum extent permitted by law. Any views expressed in this publication are the views of the authors and are not the views of Taylor & Francis.

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