Journal Details
International Journal of Optomechatronics
Newly Accepted into Thomson Reuters (formerly ISI) Science Citation Index Expanded!
Published By: Taylor & Francis
Volume Number: 4
Frequency: 4 issues per year
Print ISSN: 1559-9612
Online ISSN: 1559-9620
Editorial Board
Editor-in-Chief:
Hyungsuck Cho - Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Dae Jeon, Korea
Associate Editors
M. Tabib-Azar - Case Western Reserve University, USA
F. Chaumette - IRISA/INRIA Rennes, France
S. Fatikow - University of Oldenburg, Germany
I. Fujieda - Ritsumeikan University, Japan
K. Hane - Tohoku University, Japan
H. M. Hui - National University of Singapore, Singapore
S. Kaneko - Hokkaio University, Japan
J. Kofman - University of Waterloo, Canada
G. K. Knopf - The University of Western Ontario, Canada
M. Kujawinska - Warsaw University of Technology, Poland
K. Kurabayashi - University of Michigan, USA
M. V. Matham - Nanyang Technological University, Singapore
B. Nelson - ETH-Zentrum, Switzerland
W. Osten - Universität Stuttgart Institut für Technische Optik, Germany
Y. Otani - Tokyo University of Agriculture of Agriculture and Technology, Japan
F. Sharifi - Ryerson University, Canada
P. Tománek - Brno Univesrity of Technology, Czech Republic
R. Tutsch - Technische Universitat Braunschweig, Germany
J. Ting-Yung Wen - Rensselaer Polytechnic Institute, USA
Editorial Board
Y. Bellouard - Technische Universiteit Eindhoven, Netherlands
G. P. Carman - University of California at Los Angeles, USA
J. L. Fernandez - University of Vigo, Spain
A. Gasteratos - Democritus University of Thrace, Greece
D. G. Gweon - Korea Advanced Institute of Science and Technology, Korea
A. Ishii - Ritsumeikan University, Japan
G. H. Kaufmann - Instituto de Física Rosario (CONICET—UNR), Argentina
M. Y. Kim - Kohyoung Technology Co. Ltd., Korea
D. W. de Lima Monteiro - Universidade Federal de Minas Gerais, Brazil
C. A. Perez - Universidad de Chile, Chile
M. Tabib-Azar - Case Western Reserve University, USA
F. Chaumette - IRISA/INRIA Rennes, France
S. Fatikow - University of Oldenburg, Germany
I. Fujieda - Ritsumeikan University, Japan
K. Hane - Tohoku University, Japan
H. M. Hui - National University of Singapore, Singapore
S. Kaneko - Hokkaio University, Japan
J. Kofman - University of Waterloo, Canada
G. K. Knopf - The University of Western Ontario, Canada
M. Kujawinska - Warsaw University of Technology, Poland
K. Kurabayashi - University of Michigan, USA
M. V. Matham - Nanyang Technological University, Singapore
B. Nelson - ETH-Zentrum, Switzerland
W. Osten - Universität Stuttgart Institut für Technische Optik, Germany
Y. Otani - Tokyo University of Agriculture of Agriculture and Technology, Japan
F. Sharifi - Ryerson University, Canada
P. Tománek - Brno Univesrity of Technology, Czech Republic
R. Tutsch - Technische Universitat Braunschweig, Germany
J. Ting-Yung Wen - Rensselaer Polytechnic Institute, USA
Editorial Board
Y. Bellouard - Technische Universiteit Eindhoven, Netherlands
G. P. Carman - University of California at Los Angeles, USA
J. L. Fernandez - University of Vigo, Spain
A. Gasteratos - Democritus University of Thrace, Greece
D. G. Gweon - Korea Advanced Institute of Science and Technology, Korea
A. Ishii - Ritsumeikan University, Japan
G. H. Kaufmann - Instituto de Física Rosario (CONICET—UNR), Argentina
M. Y. Kim - Kohyoung Technology Co. Ltd., Korea
D. W. de Lima Monteiro - Universidade Federal de Minas Gerais, Brazil
C. A. Perez - Universidad de Chile, Chile
