Editor-in-Chief:

Hyungsuck Cho - Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Dae Jeon, Korea

Associate Editors

F. Ben Amara – University of Toronto, Canada
F. Chaumette - IRISA/INRIA Rennes, France
S. Fatikow - University of Oldenburg, Germany
I. Fujieda - Ritsumeikan University, Japan
M.H. Hong - National University of Singapore, Singapore
S. Kaneko - Hokkaio University, Japan
G. K. Knopf - The University of Western Ontario, Canada
J. Kofman - University of Waterloo, Canada
M.V. Matham - Nanyang Technological University, Singapore
B. Nelson - ETH-Zentrum, Switzerland
W. Osten - Universit t Stuttgart Institut f r Technische Optik, Germany
Y. Otani - Tokyo University of Agriculture and Technology, Japan
Y. Peter – Ecole Polytechnique de Montreal, Canada
N.A. Riza – University of Central Florida, USA
M. Schmidt - University of Erlangen-Nurnberg, Germany
F. Sharifi - Ryerson University, Canada
R. Tutsch - Technische Universitat Braunschweig, Germany
J. Ting-Yung Wen - Rensselaer Polytechnic Institute, USA

Editorial Board

Y. Bellouard - Technische Universiteit Eindhoven, Netherlands  
C. Braxmaier – University of Applied Science Konstanz, Germany
H.J. Cho – University of Central Florida, USA
D. Cojoc – CNR-INFM, Italy
A. Gasteratos - Democritus University of Thrace, Greece
C. Gorecki – Université de Franche-Comté, France
D. G. Gweon - Korea Advanced Institute of Science and Technology, Korea
C.K. Lee – National University of Singapore, Singapore
M. Y. Kim - Kohyoung Technology Co. Ltd., Korea
C. A. Perez - Universidad de Chile, Chile
W. Wang – University of Washington, USA
H. Xie – University of Florida, USA
J.X.J. Zhang – University of Texas at Austin, USA