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Journal Details

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Plasma Devices and Operations

Plasma Devices and Operations


Published By: Taylor & Francis
Volume Number: 17
Frequency: 4 issues per year
Print ISSN: 1051-9998
Online ISSN: 1029-4929
 

Abstracting & Indexing

Plasma Devices and Operations is abstracted in: Chemical Abstracts Service; ISI; New Jour; SciBase and SCOPUS.

 
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