Editor-in-Chief

Kazinierz Adamiak – University of Western Ontario, London, Ontario CANADA
Goodarz Ahmadi – Clarkson University, Potsdam, NY USA
W. Balachandran – Brunel University, Uxbridge, Middlesex UK
Ahmed Busnaina – Northeastern University, Boston, MA USA
Hugh Carlon – US Army Chemical R&D and Engineering Center, Aberdeen Providing Ground, MA USA
Quingru Chen – China University of Mining & Technology, Jaingsu PEOPLE'S REPUBLIC of CHINA
Lucien Dascalescu – CNRS, Grenoble, Cedex 9, FRANCE
Hitoshi Emi – National Taiwan Institute of Technology, Taipei TAIWAN
Yushu Gao – University of Utah, Salt Lake City, UT USA
Leon Glicksman – Massachusetts Institute of Technology, Cambridge, MA USA
Tony Hickey – University of North Carolina, Chapel Hill, NC USA
Y. Hoshino – Nippon Institute of Technology, Saitama JAPAN
Haim Kalman – Ben Gurion University of the Negev, Beer Sheva, ISRAEL
Kevin Kittle – Courtslaulds Coaings LTD, Tyne & Wear, UK
H. Kono - USA
Y.Ku - Taiwan
Ken W. Lee - S. Korea
CNR Marasbini – Rome, ITALY
George Marshall – Lexmark International INC, Longmont, CO USA
R. Miller – United Technologies Chemical Systems, San Jose, CA USA
K. Mittal – Hopewell, NY USA
Jeffrey Mountain – University of Illinios at Urbana-Champaign, Urbana, IL USA
Kohichi Nakamura – Science University of Tokyo, Tokyo JAPAN
Kirk Newman – Naval Surface Warfare Center, Yorktown Heights, VA USA
Kenneth Nicholson – Cirencester, UK
Stephen Passman – Sandia National Laboratories, Washington D.C. USA
Robert Peters – Argonne National Laboratory, Argonne, IL USA
T. Ptak - USA
K. Rajagopal – Texas A&M University, College Station, TX USA
Raj Rajamani – University of Utah, Salt Lake City, UT USA
D. Riley - USA
Mahendra Sharma – Eastman Kodak Company, Kingsport, TN USA
C. Shook – University of Saskatchewan, Saskatoon, SK CANADA
M. Sinha – California Institute of Technology, Pasadena, CA USA
S. Viswanathan - Singapore
Peter Walzel – Univ Gesamthochschule Essen, Essen 1, GERMANY