John P. Fackler Jr.

Editorial Board

Richard Adams - South Carolina University, Columbia, South Carolina
Ivano Bertini - Universita degli Studi di Fierenze, Italy
Fausto Calderazzo - Uiversita degli Studi di Pisa, Italy
Lutz H. Gade - Universitat Heidelberg, Germany
Harry B. Gray - California Institute of Technology, Pasadena, CA
Hans Ulrich Güdel - Bern University, Switzerland
Michael Hopkins  - University of Chicago, Chicago, IL
Jean-Marie Lehn - Institut de Chimie, Strasbourg, France
Jack Lewis - University Chemical Laboratory, Cambridge, UK
Dan Nocera  - Massachusetts Institute of Technology, Cambridge, MA
Raphael Raptis - University of Puerto Rico, San Juan, Puerto Rico
Jan Reedijk - Leiden University, The Netherlands
Tobin J. Marks - Northwestern University, Evanston, Illinois
Louis Michael Rendina - The University of Sydney, Australia
Ward T. Robinson - University of Canterbury, Christchurch, New Zealand
Claus E. Schäffer - University of Copenhagen, Denmark
Helmut Sigel - University of Basel, Switzerland
F.G.A. Stone - Baylor University, Waco, Texas
Helmut Werner - Institut für Anorganische Chemie der Universität Würzburg, Germany
Richard Winpenny - The University of Manchester, Manchester, UK
Raymond Wong - Hong Kong Baptist University, Hong Kong, China
Vivian W. W. Yam  - University of Hong Kong, China
Akio Yamamoto - Waseda University, Tokyo, Japan
Xiao-Zeng You - Nanjing University, People's Republic of China
Hong-Cai Zhou -Texas A&M University, College Station, Texas