Editor-in-Chief

Johan Sjöblom
Ugelstad Laboratory
Norwegian University of Sciences and Technology
Department of Chemical Engineering
Sem Saelandsvej 4, N-7491 Trondheim, Norway
Tel: +47 73 59 55 05 Fax: +47 73 59 40 80
Email: johsj@chemeng.ntnu.no

Founding Editors

Stig E. Friberg - 1695 Goldentree Place, Charlottesville, Virginia 22911, USA
Dr. Paul Becher (deceased)

Editors Emeriti

John Texter - Strider Research Corporation, 265 Clover St., Rochester, New York 14610, USA

Regional Editors

Latin America: J.-L. Salager
Lab. FIRP, Ingenier a Qu mic
Universidad de los Andes
Marida, Venezuela

Western Europe: Johan Sj blom
Trondheim, Norway

Far East: R. Guo
Yangzhou University
Yangzhou, China

Australia: P. J. Scales
University of Melbourne
Victoria, Australia

Editorial Board

S.I. Anderson - Technical University of Denmark, Lyngby, Denmark
D.Z. Becher - Monsato Corporation, St. Louis, Missouri, USA
P. Claesson - Royal Institute of Technology, Stockholm, Sweden
D. Clausse - University of Compi gne, Compi gne, France
A. Dukhin - Dispersion Technology, Bedford Hills, New York, USA
S.S. Dukhin - Goldens Bridge, New York, USA
T. Fort, Jr. - Vanderbilt University, Nashville, Tennessee, USA
N. Garti - Casali Institute for Applied Chemistry, Hebrew University, Jerusalem, Israel
J. Genser - North Carolina State University, Raleigh, North Carolina, USA
K. Holmberg - Chalmers University of Technology, G teborg, Sweden
I.B. Ivanov - University of Solfia, Bulgaria
G.J.M. Koper - Technical University of Delft, The Netherlands
P. Kumar - The Dow Chemical Company, Midland, Michigan, USA 
G.Z. Li - University of Shangdong, Jinan, Shangong, China
J. Laine - Helsinki University of Technology, Helsinki, Finland
M. Lindgren - Norwegian University of Science and Technology, Trondheim, Norway
B. Lindman - Lund University, Lund, Sweden
O. Mullins - Schlumberger Company, Houston, Texas, USA
G. Oye - Norwegian University of Science and Technology, Trondheim, Norway

E. Pelizetti - Universit de Torino, Torino, Italy
R. Rodgers - Florida State University, Tallahasee, Florida, USA
R.L. Rowell - University of Massechusetts, Amherst, Massachusetts, USA
E.D. Shchukin - John Hopkins University, Baltimore, Maryland, USA
P. Stenius - Helsinki University of Technology, Helsinki, Finland
M. St cker - Sintef, Oslo, Norway
C. Tsouris - Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA
C.J. Van Oss - State University of New York, Buffalo, New York, USA
L. Wang – Tsinghua University, Beijing, China

D.T. Wasan - Illinois Institute of Technology, Chicago, Illinois, USA